Fig. 1. Schematic diagram of simulation of Si/Ge interface.Si/Ge界面模拟示意图

Fig. 2. Diagram of stress calculation of Si and Ge system.Si和Ge体系应力计算示意图

Fig. 3. Variation of stress at Si/Ge interface under different sizes of Ge.不同Ge尺寸下Si/Ge界面应力的变化

Fig. 4. Relationship between distance L_Gstressand Ge when stress is relaxed to 200 MPa. 应力下降到200 MPa的位置与界面间距L_Gstress与Ge尺寸的关系

Fig. 5. Effect of different point defect density on stress at Si/Ge interface in buffer layer.缓冲层缺陷密度对Si/Ge界面应力的影响

Fig. 6. Effect of different point defect density on the stress.不同密度的空位缺陷对应力的影响规律

Fig. 7. Relationship of the Si/Ge interface stress difference and the single defect interface stress difference with the defect density.Si/Ge界面应力差及单缺陷产生的应力差与缺陷密度的关系