Overlay Metrology for Lithography Machine

Yiming Li; Lin Yang; Xiaohao Wang; Shuonan Shan; Fuyuan Deng; Zhixue He; Zhengtong Liu; Xinghui Li

doi:10.3788/LOP202259.0922023

Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922023(2022)

Overlay Metrology for Lithography Machine

Yiming Li^1,2, Lin Yang³, Xiaohao Wang¹, Shuonan Shan¹, Fuyuan Deng¹, Zhixue He², Zhengtong Liu², and Xinghui Li^1,2,4、*

Author Affiliations

¹Shenzhen International Graduate School, Tsinghua University, Shenzhen 518055, Guangdong , China

²Peng Cheng Laboratory, Shenzhen 518055, Guangdong , China

³The Fifth Electronic Research Institute of MIIT, Guangzhou 511370, Guangdong , China

⁴Tsinghua-Berkeley Shenzhen Institute, Tsinghua University, Shenzhen 518055, Guangdong , China

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Yiming Li, Lin Yang, Xiaohao Wang, Shuonan Shan, Fuyuan Deng, Zhixue He, Zhengtong Liu, Xinghui Li. Overlay Metrology for Lithography Machine[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922023

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Paper Information

Category: Optical Design and Fabrication

Received: Apr. 6, 2022

Accepted: Apr. 13, 2022

Published Online: May. 10, 2022

The Author Email: Li Xinghui (li.xinghui@sz.tsinghua.edu.cn)

DOI:10.3788/LOP202259.0922023

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology