The present status and recent advances in nanofabrication of X-ray diffractive lenses in domestic and overseas were reviewed. The research and achievements of in the past three years by authors group were introduced. For the key technology of diffractive lenses， the basic processes of electron beam lithography for large aspect ratio profiles in resists was established. By combing with Au electroplating， a solid technical background for nanoscale zone plates was successfully built up and applied to the fabrications of Siemens stars and grating based beam shapers. Furthermore， by applying Monte Carlo simulation and developing dynamics， the aspect ratio (zone height/zone width)limit by electron beam lithography was explored and the physical essence leading to the limit was discussed. A serial of diffractive lenses， such as 50—100 nm zone plates (in which the 100 nm zone plate shows its aspect ratio of 16∶1)，50—300 nm Siemens stars(in which the 300 nm Siemens star has the aspect ratio of 10∶1)and 200 nm grating based condensers(with the aspect ratio of 10∶1)were successfully fabricated. The optical characterizations of these fabricated lenses were measured in Shanghai Light Source， It demonstrates that the focusing spot of 100 nm zone plate is 234 nm. The 300 nm Siemens stars and the condensers fabricated in this work show their optical quality at the world level. The standard deviation of the illuminated intensity is measured to be 1%. Finally， this paper summarizes the development of X-ray diffraction lenses in our country in recent years， and points out that the biggest bottleneck of the development of diffraction optics is the interaction between resolution and diffraction efficiency. It puts forward some specific ways to improve the diffraction efficiency of optics and gives a technical road-map for the lens technique in China in the next five years.