[1] [1] Munro E,Chu H C. Numerical analysis of electron beam lithography systems[J]. Optik,1982,61(4):371-390.

[2] [2] Xin-rong jiang. The field solution for multipole electrostatic deflectors[J]. Vac.Sci.Technol.B,1987,5(6):2795-2798.

[3] [3] Munro E. Design and optimization of magnetic lens and deflection system for electron beams[J]. Vac.Sci.Technol,1975,12(6):1146-1150.

[4] [4] Ohiwa H. Moving objective lens and the fraunhofer condition for pre-deflection[J]. Optik,1979,53(1):63-68.

[5] [5] Pfeiffer H C. New imaging and deflection concept for probe-forming microfabrication system[J]. Vac.Sci.Technol,1975,12(6):1170-1173.

[6] [6] Pfeiffer H C,Langner G O. Advanced deflection concept for large area,high resolution e-beam lithography[J]. Vac.Sci.Technol,1981,19(6):1058-1062.

[7] [7] Chen Z W,Qiu P Y,Wang J K. The optical properties of Swinging Objective Lens in a combined magneticlens and deflection system with superimposed field[J]. Optik,1983,64(4):341-347.

[8] [8] Stickel W,Langner G O. Telecentric beam position for advanced E-beam lithography[J]. Microcircuit Eng,1992,17(4):25-28.

[10] [10] Yan Zhao,Anjam Khursheed. Variable axis lens of mixed electronstatic and magnetic fields and its application in electron-beam lithography system [J]. Vac.Sci.Technol.B,1999,17(6):2795-2798.

[11] [11] Yasumichi. Uno,Morita H,Simazu N. Fifth-order aberration analysis of a combined electrostatic magnetic focusing deflection system[J]. Nuclear intrusments and methods in physics research A,1995,363(10):10-17.

[12] [12] PROJECTION. Softwore,Version 3.2,User Manual[M]. London,UK:Munro's Electron Beam Software Ltd,2001.

[13] [13] Rao V R M,Nixon W C. A compuctational and experimental analysis of fifth-order deflection aberrations [J]. Vac.Sci.Technol,1981,19(4):1037-1040.

[14] [14] Munro E,Zhu X,Rouse J. High-order and multipole aberrations by aberration integral and direct ray-tracing methods[J]. Journal of Microscopy,1995,179(2):161-169.

[16] [16] Liu Han-yi,Tang Wen-jian. A wire electronic discharge machine saddle-type deflector for electron beam lithography systems[J]. Vac.Sci.Technol.B,1989,l7(1):86-88 .

[18] [18] Wen qi Gu,Nian kan Kang,Hong Xue,et al. DY-7 sub-0.1 micron lithography system[J]. Microelectron.Eng,2001,57(1):191-198.