Journal of the Chinese Ceramic Society, Volume. 51, Issue 4, 907(2023)

Recent Development on Ultra-Low Firing Technologies of Microwave Dielectric Ceramics

LI Xiaomeng1、*, XUE Xian1, WANG Hong1,2, and GUO Jing1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    Microwave dielectric ceramics prepared via a conventional method usually require a high sintering temperature (i.e., >1 000 ℃) and long sintering time, leading to a high energy consumption and a difficulty to realize the integration and co-firing of multiple material system. Continuous innovation and development of wireless communication technology put forward higher requirements for the miniaturization and integration of microwave devices, so that some technologies for preparing low-temperature co-fired ceramic (LTCC) and ultralow-temperature co-fired ceramic (ULTCC) are developed. Developing green sintering technologies with lower sintering temperatures and higher sintering efficiencies becomes one of the research hotspots. Novel sintering technologies (i.e., liquid-phase sintering, hot press sintering, microwave sintering, spark plasma sintering, and flash sintering) promote the development of microwave dielectric ceramics. A novel ultra-low temperature sintering technology called cold sintering process is proposed. The sintering temperature of cold sintering process is rather low (≤300 ℃), which can densify ceramics in a short time, and has some advantages in the phase stability, co-firing of multiple materials and grain boundary manipulation, thus providing an opportunity for the development of ultra-low temperature sintering technology and microwave dielectric material system.

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    LI Xiaomeng, XUE Xian, WANG Hong, GUO Jing. Recent Development on Ultra-Low Firing Technologies of Microwave Dielectric Ceramics[J]. Journal of the Chinese Ceramic Society, 2023, 51(4): 907

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    Paper Information

    Special Issue:

    Received: Aug. 28, 2022

    Accepted: --

    Published Online: Apr. 15, 2023

    The Author Email: Xiaomeng LI (2718953732@qq.com)

    DOI:

    CSTR:32186.14.

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