Acta Optica Sinica, Volume. 43, Issue 13, 1320004(2023)
Development of Precise 3D Mask Model with Reduced Runtime for Lithography
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Han Bao, Yong Zhang. Development of Precise 3D Mask Model with Reduced Runtime for Lithography[J]. Acta Optica Sinica, 2023, 43(13): 1320004
Category: Optics in Computing
Received: Dec. 21, 2022
Accepted: Mar. 8, 2023
Published Online: Jul. 12, 2023
The Author Email: Zhang Yong (zhangyong@siat.ac.cn)