Optics and Precision Engineering, Volume. 32, Issue 7, 956(2024)

High-precision laser confocal measurement of semiconductor wafer thickness

Zhaoyu LI... Zihao LIU, Yaoying WANG, Lirong QIU and Shuai YANG* |Show fewer author(s)
Author Affiliations
  • MIIT Key Laboratory of Complex-field Intelligent Exploration, Beijing Institute of Technology, School of Optics and Photonics, Beijing Institute of Technology, Beijing100081, China
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    Figures & Tables(17)
    Confocal system chromatographic focusing principle
    Combined response of two reflective layers
    Internal light tracing model of wafer
    Block diagram of laser confocal semiconducting wafer thickness measurement sensor system
    Physical map of laser confocal semiconducting wafer thickness measurement sensor system
    Influence of Δn on Tphs with different NA
    Influence of NA discrepancy on Δn and Δn
    Relationship between MOP and Δu with different f0
    Axial response curves for different pinhole sizes
    Variation of curve parameters with different normalized radii
    Optical resolution testing
    Samples of different semiconductor wafers
    Axial response curve of laser confocal sensor
    Curves of measurement results for different wafers
    • Table 1. Results of system axial measurement range testing

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      Table 1. Results of system axial measurement range testing

      Number of

      measurements

      Minimum

      position/μm

      Maximum

      position/μm

      Range/μm
      1-0.0125 739.4605 739.472
      20.2365 739.3805 739.144
      30.1165 739.3725 739.256
      40.1365 739.3245 739.188
      5-0.0165 739.2845 739.300
    • Table 2. Repeatability test results of laser confocal sensor peak point

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      Table 2. Repeatability test results of laser confocal sensor peak point

      Number of measurementsCoordinates of peak point/μm
      1162.852 7
      2162.817 1
      3162.835 4
      4162.789 1
      5162.874 3
      6162.835 1
      7162.834 3
      8162.857 1
      9162.828 1
      10162.810 3
      Repeatability0.023 25
    • Table 3. Results of wafer thickness measurement

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      Table 3. Results of wafer thickness measurement

      Wafer sample

      Measurement

      result/μm

      Measurement

      repeatability/μm

      Si525.156 2±0.0330.071 1
      GaAs653.009 0±0.0380.066 7
      GaN373.703 1±0.0340.083 7
      Sapphire655.719 6±0.0490.085 0
      SiC358.102 4±0.0290.090 4
      HR-SiC533.098 2±0.0290.098 8
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    Zhaoyu LI, Zihao LIU, Yaoying WANG, Lirong QIU, Shuai YANG. High-precision laser confocal measurement of semiconductor wafer thickness[J]. Optics and Precision Engineering, 2024, 32(7): 956

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    Paper Information

    Category:

    Received: Nov. 13, 2023

    Accepted: --

    Published Online: May. 28, 2024

    The Author Email: YANG Shuai (yangshuai_bit@163.com)

    DOI:10.37188/OPE.20243207.0956

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