According to the demands of a free electron laser( Dalian Coherent Light Source, DCLS) at extreme ultraviolet (EUV) for high resolution plane holographic varied-line-space grating, a plane holographic varied-line-space grating was fabricated based on optical path difference and aberration principle. By using the improved local optimization algorithm, recording parameters of the varied-line-space grating were calculated. The varied-line-space grating at EUV with a center groove density of 600 gr/mm, a duty cycle of 0.46,a groove depth of 550 nm and an effective score area 30 mm×30 mm was fabricated on a silicon substrate by using the holographic method. The groove density of the varied-line-space grating was measured by Littrow diffraction and its theoretical resolution was analyzed by aberration theory. The results show that the groove density in an active area is less than 0.175 gr/mm, namely the resolution is far above 12 000 in 50-150 nm EUV region, which meets the demand of the DCLS. It concludes that these theories and research findings provide theoretical and technical supports for improving the quality of plane varied-line-space gratings.