Near-zero-adhesion-enabled intact wafer-scale resist-transfer printing for high-fidelity nanofabrication on arbitrary substrates

Zhiwen Shu; Bo Feng; Peng Liu; Lei Chen; Huikang Liang; Yiqin Chen; Jianwu Yu; Huigao Duan

doi:10.1088/2631-7990/ad01fe

International Journal of Extreme Manufacturing, Volume. 6, Issue 1, 15102(2024)

Near-zero-adhesion-enabled intact wafer-scale resist-transfer printing for high-fidelity nanofabrication on arbitrary substrates

Zhiwen Shu1...2, Bo Feng1,2, Peng Liu3, Lei Chen1,2, Huikang Liang1,2, Yiqin Chen1,2,4, Jianwu Yu1, and Huigao Duan1,24,* |Show fewer author(s)

Author Affiliations

¹College of Mechanical and Vehicle Engineering, National Engineering Research Centre for High Efficiency Grinding, Hunan University, Changsha 410082, People’s Republic of China

²Greater Bay Area Institute for Innovation, Hunan University, Guangzhou 511300, People’s Republic of China

³School of Mechanical Engineering, Hunan University of Science and Technology, Xiangtan 411201, People’s Republic of China

⁴Shenzhen Research Institute, Hunan University, Shenzhen 518000, People’s Republic of China

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Zhiwen Shu, Bo Feng, Peng Liu, Lei Chen, Huikang Liang, Yiqin Chen, Jianwu Yu, Huigao Duan. Near-zero-adhesion-enabled intact wafer-scale resist-transfer printing for high-fidelity nanofabrication on arbitrary substrates[J]. International Journal of Extreme Manufacturing, 2024, 6(1): 15102

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Paper Information

Received: Aug. 10, 2023

Accepted: --

Published Online: Jul. 19, 2024

The Author Email: Duan Huigao (duanhg@hnu.edu.cn)

DOI:10.1088/2631-7990/ad01fe

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

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