Chinese Journal of Lasers, Volume. 36, Issue s2, 252(2009)

Processing Technology of Interferogram of Thin Film Thickness Measurement

Ge Jinman* and Su Junhong
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  • [in Chinese]
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    References(6)

    [1] [1] Yin Chunyong. Modern Interferogrometric Measuring Technique[M]. Tianjin:Tianjin University Press,1997

    [2] [2] Chengchih Hsu,Juyi Lee,Derchin Su. Thickness and optical constants measurement of thin film growth with circular heterodyne interferometry[J]. Thin Solid Films,2005,491(1-2):91-95

    [3] [3] P. Hlubina,D. Ciprian,J. Lunacek et al.. Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry[J]. Appl. Phys. B,2006,84(3):511-516

    [4] [4] James J. Talamonti,Richard B. Kay,Danny J. Krebs. Numerical model estimating the capabilities and limitations of the fast Fourier transform technique in absolute interferometry[J]. Appl. Opt.,1996,35(13):2182-2191

    [5] [5] Su Junhong. Interferogram region spreading technology in spatial domain[J]. Infrared and Laser Engineering,2003,34(4):397-400

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    Ge Jinman, Su Junhong. Processing Technology of Interferogram of Thin Film Thickness Measurement[J]. Chinese Journal of Lasers, 2009, 36(s2): 252

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    Paper Information

    Category: Measurement and metrology

    Received: --

    Accepted: --

    Published Online: Dec. 30, 2009

    The Author Email: Jinman Ge (gjm129@163.com)

    DOI:10.3788/cjl200936s2.0252

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