Acta Photonica Sinica, Volume. 44, Issue 5, 531003(2015)

Finite Element Analysis of Temperature Rising in VO2 Thin Films Under Irradiation of CO2 Pulse Laser

XU Kai*... LU Yuan, LING Yong-shun and QIAO Ya |Show fewer author(s)
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    References(14)

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    [3] [3] LU Yuan, LING Yong-shun, FENG Yun-song, et al. Analysis of VO2 thin film intelligent protection against pulsed power infrared-laser[J]. Infrared and Laser Engineering, 2012, 41(11): 2886-2890.

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    [12] [12] DAI Fu, XIONG Sheng-min, GONG Zi-zheng, et al. The temperature rise in films at the repeat rate pulse laser irradiation determined based on finite element method[J]. Infrared and Laser Engineering, 2009, 26(6): 510-514.

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    [1] WANG Fei, LI Yu-yao, CHE Ying, FU Xiu-hua, TIAN Ming. Measurement System of Flattop Laser Induced Damage Threshold to Film[J]. Acta Photonica Sinica, 2016, 45(3): 314003

    [2] LIU Zhi-wei, LU Yuan, FENG Yun-song, LIU Rui-huang, HU Jie. Experiments and Theoretical Calculations of VO2 Thin Films Irradiated by Pulse Laser[J]. Acta Photonica Sinica, 2018, 47(10): 1031001

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    XU Kai, LU Yuan, LING Yong-shun, QIAO Ya. Finite Element Analysis of Temperature Rising in VO2 Thin Films Under Irradiation of CO2 Pulse Laser[J]. Acta Photonica Sinica, 2015, 44(5): 531003

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    Paper Information

    Received: Dec. 17, 2014

    Accepted: --

    Published Online: May. 26, 2015

    The Author Email: XU Kai (xukai0110@foxmail.com)

    DOI:10.3788/gzxb20154405.0531003

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