Opto-Electronic Engineering, Volume. 47, Issue 8, 200209(2020)

The research progress of surface interferometric measurement with higher accuracy

Hou Xi1,*... Zhang Shuai1,2, Hu Xiaochuan1, Quan Haiyang1, Wu Gaofeng1, Jia Xin1, He Yiwei1, Chen Qiang1 and Wu Fan1 |Show fewer author(s)
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    CLP Journals

    [1] Zhang Shuai, Quan Haiyang, Hou Xi, Hu Xiaochuan, Wu Gaofeng. Absolute testing of planarity and inhomogeneity with modified six-step method[J]. Opto-Electronic Engineering, 2021, 48(7): 210047

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    Hou Xi, Zhang Shuai, Hu Xiaochuan, Quan Haiyang, Wu Gaofeng, Jia Xin, He Yiwei, Chen Qiang, Wu Fan. The research progress of surface interferometric measurement with higher accuracy[J]. Opto-Electronic Engineering, 2020, 47(8): 200209

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    Paper Information

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    Received: Jun. 5, 2020

    Accepted: --

    Published Online: Oct. 28, 2020

    The Author Email: Xi Hou (hxxh6776@163.com)

    DOI:10.12086/oee.2020.200209

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