Opto-Electronic Engineering, Volume. 47, Issue 8, 200209(2020)
The research progress of surface interferometric measurement with higher accuracy
With the continuous development of modern optics, such as EUV, DUV lithography and the advanced light source, the surface interferometric measurement with higher accuracy has become an important challenge. The surface accuracy as one of key technical parameters will be required to nanometer, sub-nanometer, even picometer. The surface interferometric measurement with higher accuracy push the limits of surface metrology, has important research significance and application value. This paper analyzes the development trends of surface interferometric measurement with higher accuracy and reports the related research progress of Institute of Optics and Electronics, Chinese Academy of Sciences.
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Hou Xi, Zhang Shuai, Hu Xiaochuan, Quan Haiyang, Wu Gaofeng, Jia Xin, He Yiwei, Chen Qiang, Wu Fan. The research progress of surface interferometric measurement with higher accuracy[J]. Opto-Electronic Engineering, 2020, 47(8): 200209
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Received: Jun. 5, 2020
Accepted: --
Published Online: Oct. 28, 2020
The Author Email: Xi Hou (hxxh6776@163.com)