Acta Photonica Sinica, Volume. 35, Issue 1, 130(2006)

Design of Band-pass Filters for the Power Spectral Density Analysis

Chen Wei1...2,*, Yao Hanmin1, Wu Fan1, Fan Bin1, Wu Shibin1 and Chen Qiang1 |Show fewer author(s)
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  • 1[in Chinese]
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    References(6)

    [1] [1] Yang L. Advanced Optical Manufacture Technology.Beijing: Science Press,2001.303~308

    [2] [2] Elson J M,Bennett J M. Calculation of the power spectral density from surface profile data. Appl Opt,1995,34(1):201~208

    [3] [3] Zhang B,Li Q,Cai B W. Acta Photonica Sinica,2004,33(5): 553~556

    [4] [4] Church E L. Fractal surface finish. Appl Opt,1988,27(8): 1518~1526

    [5] [5] Hu G S. Digital signal processing-theory,algorithms and realization. Beijing: Tsinghua University Press,2003.263~267

    [6] [6] Wang Z Y,Wu S Q,Gao X R,et al. Opto-Electronic Engineering,2005,32(4): 59~62

    CLP Journals

    [1] WANG Jia, FAN Bin, WAN Yongjian, SHI Chunyan, ZHUO Bin. A Method to Evaluate the Error Restraint Ability of CCOS Process[J]. Acta Photonica Sinica, 2014, 43(7): 722002

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    Chen Wei, Yao Hanmin, Wu Fan, Fan Bin, Wu Shibin, Chen Qiang. Design of Band-pass Filters for the Power Spectral Density Analysis[J]. Acta Photonica Sinica, 2006, 35(1): 130

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    Paper Information

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    Received: May. 26, 2005

    Accepted: --

    Published Online: Jun. 3, 2010

    The Author Email: Wei Chen (c.vikings@163.com)

    DOI:

    CSTR:32186.14.

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