Journal of Semiconductors, Volume. 43, Issue 11, 113101(2022)
Plasma atomic layer etching of GaN/AlGaN materials and application: An overview
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Lulu Guan, Xingyu Li, Dongchen Che, Kaidong Xu, Shiwei Zhuang. Plasma atomic layer etching of GaN/AlGaN materials and application: An overview[J]. Journal of Semiconductors, 2022, 43(11): 113101
Category: Articles
Received: Apr. 27, 2022
Accepted: --
Published Online: Nov. 18, 2022
The Author Email: Zhuang Shiwei (zhuangshiwei@jsnu.edu.cn)