[1] [1] LI T B. Nano scale measurement and transfer standard system ［J］. Shanghai Measurement and Testing, 2005, 32(1): 8-13. (in Chinese)

[2] [2] YAO J E.Nano-measuring instruments and nano-machining technology ［J］. Engineering Science, 2003, 5(1): 33-37. (in Chinese)

[3] [3] WU J J, LI Y, LI D SH, et al.. Design and calibration of 3D micro tactile probe based on MEMS capacitance sensor ［J］. Opt. Precision Eng., 2013, 21(12): 3087-3094. (in Chinese)

[4] [4] LIPSCOMB III W P, ALLGAIR J A, BUNDAY B D, et al.. Calibrating optical overlay measurements ［C］. International Society for Optics and Photonics, 2006: 615211-615211-15.

[5] [5] ZHANG P P, MA Y, LI T B. Numerical simulation of 2D atom lithography via Monte Carlo method ［J］. Journal of Tongji University: Natural Science, 2012, 40(8): 1270-1275. (in Chinese)

[6] [6] ZHANG W J, MA Y, LI T B, et al.. Structured mirror array for two-dimensional collimation of a chromium beam in atom lithography ［J］.Chinese Physics B, 2013, (2): 228-231.

[7] [7] ZHANG M, TANG F, WANG X CH, et al.. Phase retrieval errors analysis of interfereogram using two dimensional fast fourier transfer method ［J］. Chinese Journal of Lasers, 2013, 40(3): 179-184 (in Chinese)

[8] [8] ZHANG ZH H, WANG H Y, LIU Z Q, et al.. Phase unwrapping algorithms based on fast fourier transform ［J］. Laser & Optoelectronics Progress, 2012, 49(12): 59-65. (in Chinese)

[9] [9] MISUMI I, DAI G L, LU M Z, et al.. Bilateral comparison of 25 nm pitch nanometric lateral scales for metrological scanning probe microscopes ［J］. Measurement Science and Technology, 2010, 21(3): 035105.

[10] [10] MISUMI I, KITTA J, FUJIMOTO H, et al.. 25 nm pitch comparison between a traceable x-ray diffractometer and a metrological atomic force microscope ［J］. Measurement Science and Technology, 2012, 23(1): 015002.

[11] [11] GAO X Q, DING Y M. Digital Signal Processing ［M］. Xian: Xidian University Press, 2008. (in Chinese)

[12] [12] DAI G, POHLENZ F, DANZEBRINK H U, et al.. Metrological large range scanning probe microscope ［J］. Review of Scientific Instruments, 2004, 75(4): 962-969.

[13] [13] HUANG Q X, YU F L, GONG E M, et al.. Nano-CMM stage with zero Abbe error and its error analysis ［J］. Opt. Precision Eng., 2013, 21(3): 664-671.(in Chinese)

[14] [14] LI Y, LEI L H, GAO J, et al.. Research of the optical characterization method on the nano dimension standard sample ［J］. Micronanoelectronic Technology, 2012, 49(6): 406-412. (in Chinese)

[15] [15] LEI L H, LIU Y, CHEN X, et al.. Fast and accurate calibration of 1D and 2D gratings ［J］. Advanced Materials Research, 2011, 317: 2196-2203.