Laser & Optoelectronics Progress, Volume. 55, Issue 5, 051603(2018)

Effect of Rapid Thermal Annealing on Structural and Luminescence Properties of GaAs/AlGaAs Quantum Wells

Min Zhi, Xuan Fang*; , Shouzhu Niu, Dan Fang, Jilong Tang, Dengkui Wang, Xinwei Wang, Xiaohua Wang, and Zhipeng Wei
Author Affiliations
  • State Key Laboratory of High Power Semiconductor Laser, Changchun University of Science and Technology, Changchun, Jilin 130022, China
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    The influence of rapid thermal annealing (RTA) on the structural and luminescence properties of GaAs/AlGaAs quantum wells is investigated. The results show that, when the annealing temperature is 800 ℃, the crystal quality and photoluminescence (PL) intensity is significantly improved. When the annealing temperature is 900 ℃, the crystal quality and PL intensity decrease. According to the peak energy theory, the luminous mechanism at room temperature of PL peaks is obtained. A whole RTA-induced blue shift of PL peaks is observed by peak-differentiating and fitting. The PL mapping demonstrates that RTA can significantly improve the whole crystal quality and the luminous uniformity of materials.

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    Min Zhi, Xuan Fang, Shouzhu Niu, Dan Fang, Jilong Tang, Dengkui Wang, Xinwei Wang, Xiaohua Wang, Zhipeng Wei. Effect of Rapid Thermal Annealing on Structural and Luminescence Properties of GaAs/AlGaAs Quantum Wells[J]. Laser & Optoelectronics Progress, 2018, 55(5): 051603

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    Paper Information

    Category: Materials

    Received: Dec. 12, 2017

    Accepted: --

    Published Online: Sep. 11, 2018

    The Author Email: Fang Xuan ( fangxuan110@126.com)

    DOI:10.3788/LOP55.051603

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