Implications of using two low-power continuous-wave lasers for polishing

Wenxuan Zhang; Kiwan Wong; Miguel Morales; Carlos Molpeceres; Craig B Arnold

doi:10.1088/2631-7990/ab94c6

International Journal of Extreme Manufacturing, Volume. 2, Issue 3, 35101(2020)

Implications of using two low-power continuous-wave lasers for polishing

Wenxuan Zhang1...2,*, Kiwan Wong3, Miguel Morales4, Carlos Molpeceres4, and Craig B Arnold25 |Show fewer author(s)

Author Affiliations

¹Department of Chemical and Biological Engineering, Princeton University, Princeton, NJ 08544, United States of America

²Princeton Institute for the Science and Technology of Materials, Princeton University, Princeton, NJ 08544, United States of America

³Department of Mechanical and Aerospace Engineering, The Hong Kong University of Science and Technology, Hong Kong, China

⁴Centro L′aser UPM, Universidad Polit′ecnica de Madrid, Alan Turing 1, 28031, Madrid, Spain

⁵Department of Mechanical and Aerospace Engineering, Princeton University, Princeton, NJ 08544, United States of America

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Wenxuan Zhang, Kiwan Wong, Miguel Morales, Carlos Molpeceres, Craig B Arnold. Implications of using two low-power continuous-wave lasers for polishing[J]. International Journal of Extreme Manufacturing, 2020, 2(3): 35101

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Paper Information

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Received: Feb. 3, 2020

Accepted: --

Published Online: Jan. 28, 2021

The Author Email: Zhang Wenxuan (cbarnold@princeton.edu)

DOI:10.1088/2631-7990/ab94c6

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology

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