Laser & Optoelectronics Progress, Volume. 52, Issue 4, 41602(2015)
Range Analysis of Thermal Stress and Displacement of GaN films on Al2O3 Substrate
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Wang Xiaozeng. Range Analysis of Thermal Stress and Displacement of GaN films on Al2O3 Substrate[J]. Laser & Optoelectronics Progress, 2015, 52(4): 41602
Paper Information
Category: Materials
Received: Nov. 6, 2014
Accepted: --
Published Online: Apr. 2, 2015
The Author Email: Xiaozeng Wang (21772778@qq.com)
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