Journal of Radiation Research and Radiation Processing, Volume. 41, Issue 4, 040205(2023)

Study on degradation of methyl red dye wastewater by dielectric barrier discharge low temperature plasma

Haixia LI1... Yujie ZHOU1, Ying WU1, Chiyuan WEI1, Jingjing XIE1, Peixin SHI1 and Baochang ZHOU2,* |Show fewer author(s)
Author Affiliations
  • 1Nanjing Tech University Pujiang Institute, Nanjing 211134, China
  • 2Nanjing RGE Membrane Separation Technology Co., Ltd., Nanjing 210008, China
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    Figures & Tables(7)
    Concentric tubular dielectric barrier discharge low-temperature plasma reactor
    Standard curve of methyl red solution at 521 nm
    UV visible absorption spectra of methyl red solutions at different pHs (color online)
    Changes of methyl red solution at 521 nm under different discharge powers: (a) absorbance curves over time; illustration: curves of removal rate over time; (b) graph of color changes over time
    Changes in methyl red solution at 521 nm under different initial concentrations: (a) absorbance curves over time; illustration: curves of removal rate over time; (b) graph of color changes over time
    Changes in methyl red solution at 521 nm under different initial pHs: (a) absorbance curves over time; illustration: curves of different pHs over time; (b) graph of color changes over time
    (a) Changes in absorbance of solution at 521 nm under different atmosphere conditions; illustration: variation of pH during solution degradation under different atmosphere conditions; (b) color change of solution under different atmosphere conditions
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    Haixia LI, Yujie ZHOU, Ying WU, Chiyuan WEI, Jingjing XIE, Peixin SHI, Baochang ZHOU. Study on degradation of methyl red dye wastewater by dielectric barrier discharge low temperature plasma[J]. Journal of Radiation Research and Radiation Processing, 2023, 41(4): 040205

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    Paper Information

    Category: Research Articles

    Received: Aug. 13, 2022

    Accepted: Nov. 10, 2022

    Published Online: Sep. 21, 2023

    The Author Email:

    DOI:10.11889/j.1000-3436.2022-0072

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