[1] [1] FADEL M,AZIMM O A,OMER O A,et al..A study of some optical properties of hafnium dioxide(HFO2) thin films and their applications［J］.Applied physics A.Materials Science ＆Processing.1998, 66;335-343.

[2] [2] ALVISI M,GIULIOM D,MARRONES G,et al..HfO2 films with high laser damage threshold［J］.Thin Solid Films,2000,358;250-258.

[3] [3] GAO W D,ZHANG W L,FAN SH H,et al..Effecrs of the structure of HfO2 thin films on its laser induced damage threshold［J］.Acta Photonica Sinica,2005, 34(2);176-179.

[4] [4] GU P F.Thin films technology［M］.Zhejiang University Press,1990:76.

[5] [5] ZHENG Y,LIU ZH CH,MA P,CHEN S L,ZHANG Q H.Laser conditioning technique of mid-size laser spot［J］.High Power Laser and Particle Beams,2013,25(12): 3180-3184.

[6] [6] WEI Y W,ZHANG ZH,LIU H,et al.. Laser conditioning effect on HfO2/SiO2 film［J］.High Power Laser and Particle Beams,2013,25(12):3338-332.

[7] [7] LI G, SUN L CH, YU ZH B,et al.. The polarization effect in the optical thin film ［J］. Editorial Office of Optics and Precision Engineering, 2003,11(6):647-651.

[8] [8] WANG X D,SHU X D,LIU Y,et al.. Study on ion beam etching characteristics of HfO2 film［J］. Editorial Office of Optics and Precision Engineering, 2004,12(5):454-458.