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Optics and Precision Engineering, Volume. 13, Issue z1, 34(2005)

Analysis on Si3N4 thin film based on the SiH2CL2-NH3-N2 system by LPCVD

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    [in Chinese], [in Chinese]. Analysis on Si3N4 thin film based on the SiH2CL2-NH3-N2 system by LPCVD[J]. Optics and Precision Engineering, 2005, 13(z1): 34

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    Published Online: Nov. 3, 2006

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    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology