Optics and Precision Engineering, Volume. 13, Issue z1, 34(2005)
Analysis on Si3N4 thin film based on the SiH2CL2-NH3-N2 system by LPCVD
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[in Chinese], [in Chinese]. Analysis on Si3N4 thin film based on the SiH2CL2-NH3-N2 system by LPCVD[J]. Optics and Precision Engineering, 2005, 13(z1): 34
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