Fig. 1. Schematic diagram of the fabrication of fused silica subwavelength nanostructures based on ion bombardment

Fig. 2. Temporal evolution of nanoripples morphology on photoresist surface. (a) t=0; (b) t=10 min; (c) t=20 min; (d) t=30 min; (e) t=50 min

Fig. 3. RMS roughness and wavelength of nanoripple morphologies on photoresist surface versus ion bombardment time

Fig. 4. AFM pictures of sample after different processes treatment. (a) IB; (b) RIE; (c) RIBE

Fig. 5. Measured spectral transmittance of initial and single-sided fused silica nanostructures