Acta Optica Sinica, Volume. 40, Issue 17, 1736001(2020)
Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment
In this study, self-organized nanoripples on photoresist surfaces are produced through low-energy ion bombardment (IB). Subsequently, the IB-induced photoresist nanoripples are considered as masks for fabricating subwavelength nanostructures on fused silica surfaces by reactive ion beam etching technique. Compared with pure-IB-induced fused silica nanoripples, the amplitude and aspect ratio of the proposed nanostructures increases significantly. The transmittance of the subwavelength nanostructured fused silica surfaces increases to approximately 94% for wavelengths from 600 nm to 1300 nm. Preliminary results reveal the potential of ion bombardment in the preparation of functional surface nanostructures.
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Gaoyuan Yang, Maoqi Cai, Jinyu Li, Huoyao Chen, Ying Liu, Yilin Hong. Preparation of Subwavelength Nanostructures Based on Low-Energy Ion Bombardment[J]. Acta Optica Sinica, 2020, 40(17): 1736001
Category: Letters
Received: May. 29, 2020
Accepted: Jul. 15, 2020
Published Online: Aug. 28, 2020
The Author Email: Liu Ying (liuychch@ustc.edu.cn)