Fig. 1. (Color online) (a) Schematic diagram of ALD device. (b) Schematic diagram of CVD device.

Fig. 2. (Color online) (a) SEM image of cross section of tungsten thin film. (b) The XPS pattern of tungsten thin film. (c) The photo of tungsten film.

Fig. 3. (Color online) (a) Raman spectrum at different telluride temperatures. (b) Te : W ratio-temperature curves in EDS results

Fig. 4. (a–d) XRD curves of telluride temperature at 470, 550, 560 and 580 °C. (e) FWHM of WTe₂(002) at 470, 550, 560 and 580 °C.

Fig. 5. (Color online) (a) The XPS curve of the sample at 550°C. (b) The schematic diagram of oxidation principle. (c) The oxidation principle diagram.

Fig. 6. (Color online) (a)R–T curve and (b) MR curve of tungsten telluride thin films at 550 °C tellurization temperature.