Acta Optica Sinica, Volume. 39, Issue 12, 1231001(2019)

Uniformity of Film Thickness Distribution for Single Evaporation Source

Xiuhua Fu1, Di Zhao1、*, Cheng Lu2, Guojun Ma1, and Ganghua Bao2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun, Jilin 130022, China
  • 2Chengdu Guotai Vacuum Equipment Co., Ltd., Chengdu, Sichuan 611130, China
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    References(14)

    [3] Tang J F, Gu P F, Liu X et al[M]. Modern optical thin film technology, 271-278(2006).

    [7] Kotlikov E N, Prokashev V N, Ivanov V A et al. Thickness uniformity of films deposited on rotating substrates[J]. Journal of Optical Technology, 76, 100-103(2009).

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    Xiuhua Fu, Di Zhao, Cheng Lu, Guojun Ma, Ganghua Bao. Uniformity of Film Thickness Distribution for Single Evaporation Source[J]. Acta Optica Sinica, 2019, 39(12): 1231001

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    Paper Information

    Category: Thin Films

    Received: Jul. 1, 2019

    Accepted: Aug. 14, 2019

    Published Online: Dec. 6, 2019

    The Author Email: Zhao Di (zhaodi9425@163.com)

    DOI:10.3788/AOS201939.1231001

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