Acta Optica Sinica, Volume. 16, Issue 10, 1379(1996)
Beam Homogenizer for XeCl Excimer Laser and Its Applications
A beam homogenizer was used to improve the intensity distribution of the output beam from XeCl excimer laser. The results demonstrated that the irradiation uniformity was better than 2%. Using this apparatus, the etch threshold of solid thin film was measured and excimer laser induced electrical conductivity in C 60 thin film has been studied experimentally.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Beam Homogenizer for XeCl Excimer Laser and Its Applications[J]. Acta Optica Sinica, 1996, 16(10): 1379