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Microelectronics, Volume. 53, Issue 3, 483(2023)

Research Progress of Citric Acid in CMP and Post Cleaning of Cobalt Based Copper Interconnects

DU Haoyu1...2, TAN Baimei1,2, WANG Xiaolong1,2, WANG Fangyuan1,2, and WANG Ge12 |Show fewer author(s)
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    DU Haoyu, TAN Baimei, WANG Xiaolong, WANG Fangyuan, WANG Ge. Research Progress of Citric Acid in CMP and Post Cleaning of Cobalt Based Copper Interconnects[J]. Microelectronics, 2023, 53(3): 483

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    Received: Jun. 10, 2022

    Accepted: --

    Published Online: Jan. 3, 2024

    The Author Email:

    DOI:10.13911/j.cnki.1004-3365.220222

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology