Electro-Optic Technology Application, Volume. 26, Issue 4, 53(2011)

PLD Preparation and Characterization of ZnS Films on Porous Silicon Substrates

WANG Cai-feng1,2, LI Qing-shan3, HUBo2,4, LI Wei-bing1,2, and YI Hou-hui1
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
  • 4[in Chinese]
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    ZnS films are grown at 250 ℃ and 350℃ by pulsed laser deposition (PLD)on porous silicon (PS)substrates which are prepared by electrochemical anodization. X-ray diffraction (XRD)patterns show that ZnS films are grown in preferred orientation along -ZnS (111)direction. With higher growth temperature,the diffraction peak intensity of ZnS films is larger. Scanning electron microscope (SEM)images indicate that the surface of ZnS films grown at 250 ℃ is loose and unsmoothed which is attributed to the rough structure of PS substrate while the film surface becomes smooth and compact at 350 ℃ although some crystalline grains with apparent size appears. The photoluminescence (PL)spectra is measured at room temperature,the result shows that the self-activated luminescence of ZnS films grown at 350 ℃ is larger than that of 250 ℃,while the red light intensity of PS is lower than that of 250 ℃ along with the redshift of the peak position. Combining the blue,green emission from ZnS with the red emission from PS,a broad PL band in the visible region from 450 nm to 700 nm is obtained,and the ZnS/PS composites exhibit intense white light emission.

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    WANG Cai-feng, LI Qing-shan, HUBo, LI Wei-bing, YI Hou-hui. PLD Preparation and Characterization of ZnS Films on Porous Silicon Substrates[J]. Electro-Optic Technology Application, 2011, 26(4): 53

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    Received: Jun. 11, 2011

    Accepted: --

    Published Online: Sep. 9, 2011

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