To fabricate micro/nano structures on a large-format substrate,a novel miro-area micro/nanoimprinting lithographic system was presented,and the design of this imprinting system was introduced.Focused on improving stability and realizing the rotation of an imprinting mould,the gas circuit and configuration of the imprinting mould were discussed in detail.By use of polycarbonates,the gratings with a period of 400 nm were fabricated and the precision of the platform was given.Then,by taking the fabrication of a diffusing film in a backlight unit of flat panel displays as an example,the potential application of a distributed micro-area micro/nano-imprinting lithographic method was proposed.The experimental results indicate that the positioning precision of the platfom in an 1 m long stroke is 1 nm and the rotating angle varies from -90° to 90° when the imprinting depth is controlled by heating temperature and gas pressure.A diffusing film with a thickness of 125 μm was fabricated,whose diffusing radius is 5 mm.These results suggests that the proposed micro-area nanoimprinting lithographic system should be especially suitable for fabrication of optical variable diffraction images and devices used in flat-panel displays.