Chinese Optics Letters, Volume. 2, Issue 5, 05305(2004)

Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition

Dawei Zhang1, Shuhai Fan1, Weidong Gao1, Hongbo He1, Yingjian Wang1, Jianda Shao1, Zhengxiu Fan1, and Haojie Sun2
Author Affiliations
  • 1R&
  • 2Center for Optical Thin Film Coatings, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800
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    [4] Gang Dai, Yanbei Chen, Jian Lu, Zhonghua Shen, Xiaowu Ni. Analysis of laser induced thermal mechanical relationship of HfO2/SiO2 high reflective optical thin film at 1064 nm[J]. Chinese Optics Letters, 2009, 7(7): 07601

    [5] Ping Ma, Feng Pan, Songlin Chen, Zhen Wang, Jianping Hu, Qinghua Zhang, Jianda Shao. Contamination process and laser-induced damage of HfO2/SiO2 coatings in vacuum[J]. Chinese Optics Letters, 2009, 7(7): 07643

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    [7] Ai Wanjun, Xiong Shengming. Properties of Thin Films Prepared with End-Hall and APS Ion Assisted Deposition[J]. Chinese Journal of Lasers, 2011, 38(11): 1107001

    [8] [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. A High-Reflectivity Al2O3/MgF2 Mirrors for 193 nm[J]. Chinese Journal of Lasers, 2005, 32(5): 685

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    Dawei Zhang, Shuhai Fan, Weidong Gao, Hongbo He, Yingjian Wang, Jianda Shao, Zhengxiu Fan, Haojie Sun. Study on absorbance and laser damage threshold of HfO2 films prepared by ion-assisted reaction deposition[J]. Chinese Optics Letters, 2004, 2(5): 05305

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    Paper Information

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    Received: Dec. 26, 2003

    Accepted: --

    Published Online: Jun. 6, 2006

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