[1] [1] H. Hu, R. Ricken, W. Sohler. Low-loss ridge waveguides on lithium niobate fabricated by local diffusion doping with titanium［J］. Appl. Phys. B: Lasers and Optics, 2010, 98(4): 677～679

[2] [2] Rafael Salas-Montiel, Mehmet E. Solmaz, Ohannes Eknoyan et al.. Er-doped optical waveguide amplifiers in X-cut lithium niobate by selective codiffusion［J］. IEEE Photon. Technol. Lett., 2010, 22(6): 362～364

[3] [3] Tang Donglin, Guo Feng, Liu Zenian et al.. Three-component photoelastic waveguide accelerometer based on photoelastic effect［J］. Optics and Precision Engineering, 2009, 17(5): 985～989

[4] [4] F. S. Chen, J. T. Lamacchia, D. B. Francer. Holographic storage in lithium niobate［J］. Appl. Phys., 1968, 13(7): 223～224

[5] [5] Chen Youhua, Zhang Jilong, Wang Yanchao et al.. Single crystal photo-elastic modulator based on lithium niobate piezoelectric and photo-elastic effect［J］. Acta Optica Sinica, 2012, 32(11): 1116002

[6] [6] Wan Lingyu, Zhou Yu, Liu Liren et al.. A free-space 2×4 90° optical hybrid with electro-optic modulation［J］. Acta Optica Sinica, 2012, 32(7): 0723002

[7] [7] Yao Yanqing, Li Jinyang, Wu Jianjie et al.. Research development on LiNbO3 dry etching［J］. Micronanoelectronic Technology, 2012, 49(3): 197～207

[8] [8] H. Hu, R. Ricken, W. Sohler et al.. Lithium niobate ridge waveguides fabricated by wet etching［J］. IEEE Photon. Technol. Lett., 2007, 19(6): 417～419

[9] [9] Nadège Courjal, Blandine Guichardaz, Gwenn Ulliac et al.. High aspect ratio lithium niobate ridge waveguides fabricated by optical grade dicing［J］. J. Phys. D: Appl. Phys., 2011, 44(30): 305101

[10] [10] Shaomei Zhang, Keming Wang, Xiangzhi Liu et al.. Planar and ridge waveguides formed in LiNbO3 by proton exchange combined with oxygen ion implantation［J］. Opt. Express, 2010, 18(15): 15609～15617

[11] [11] K. Noguchi, O. Mitomi, H. Miyazawa et al.. A broadband TiLiNbO3 optical modulator with a ridge structure［J］. J. Lightwave Technol., 1995, 13(6): 1164～1168

[12] [12] Kazuto Noguchi, Osamu Mitomi, Hiroshi Miyazawa. Millimeter-wave TiLiNbO3 optical modulators［J］. J. Lightwave Technol., 1998, 16(4): 615～619

[13] [13] Vijay Sivan, Arnan Mitchell, Lam Bui et al.. Etching of lithium niobate using standard Ti indiffusion technique［J］. Appl. Phys. Lett., 2007, 91(23): 231921

[14] [14] L. Gui, H. Hu, M. Garcia-Granda. Local periodic poling of ridges and ridge waveguides on X- and Y-Cut LiNbO3 and its application for second harmonic generation［J］. Opt. Express, 2009, 17(5): 3923～3928

[15] [15] H. J. Lee, S. Y. Shin. Lithium niobate ridge waveguides fabricated by wet etching［J］. Electron. Lett., 1995, 31(4): 268～269

[16] [16] Chen Fang, Liu Ruipeng, Qi Zhimei. Design, fabrication and characterization of LiNbO3-based integrated optical waveguide Mach-Zehnder interferometer［J］. Acta Optica Sinica, 2011, 31(5): 0513001

[17] [17] Cui Jianmin, Feng Lihui, Cui Fang et al.. Calculation and measurement of the refractive index of TiLiNbO3［J］. Acta Photonica Sinica, 2002, 31(Z2): 211～216

[18] [18] David E. Zelmon, David L. Small. Infrared corrected Sellmeier coefficients for congruently grown lithium niobate and 5 mol. % magnesium oxide-doped lithium niobate［J］. J. Opt. Soc. Am. B, 1997, 14(12): 3319～3322

[19] [19] E. A. J. Marcatili. Dielectric rectangular waveguide and directional coupler for integrated optics［J］. Bell System Technology Journal, 1969, 48(21): 2071～2102

[20] [20] Yi-Kuei Wu, Way-Seen Wang. Design and fabrication of sidewalls-extended electrode configuration for ridged lithium niobate electrooptical modulator［J］. J. Lightwave Technol., 2008, 26(2): 286～290

[21] [21] R.-S. Cheng, W.-L. Chen, W.-S. Wang. Mach-Zehnder modulators with lithium niobate ridge waveguides fabricated by proton-exchange wetetch and nickel indiffusion［J］. IEEE Photon. Technol. Lett., 1995, 7(11): 1282～1284

[22] [22] Miguel García-Granda, Hui Hu, J. Rodríguez-García et al.. Design and fabrication of novel ridge guide modulators in lithium niobate［J］. J. Lightwave Technol., 2009, 27(24): 5690～5697

[23] [23] Hanbin Lin, Reishin Cheng, Waysen Wang. Wide-angel low loss single-mode symmetric Y-junctions［J］. IEEE Photon. Technol. Lett., 1994, 6(7): 825～827

[24] [24] Dong Miao, Tang Xionggui, Nuermaimaiti et al.. Design and analysis for wide-angle low-loss Y-branch waveguide with graded-index profiles［J］. Acta Optica Sincia, 2009, 29(s2): 97～100

[25] [25] Naoki Mitsugi, Kaori Shima, Masumi Ishizuka et al.. Analyses of LiNbO3 wafer surface etched by ECR plasma of CHF3 & CF4［J］. Procedure Symposium of Dry Process, 1998, 20: 129～133

[26] [26] P. G. Glersen. Ion beam etching［J］. J. Vacuum Sci. Technol., 1975, 12(1): 28～35

[27] [27] Hu Xinning, Liu Gang, Tian Yangchao. Influence of ion-beam etching incidence angle on slope of pattern sidewall［J］. Microfabrication Technology, 2003, (4): 14～17

[28] [28] G. Carter. The physics and applications of ion beam erosion［J］. J. Phys. D: Appl. Phys., 2001, 34(3): R1～R2

[29] [29] Zhou Yujie, Feng Liqun, Sun Junqiang. Etching characteristics of MgO doped lithium niobate in inductively coupled plasma［J］. Chinese J. Lasers, 2012, 39(9): 0906001