Photonics Research, Volume. 11, Issue 3, B103(2023)

High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing Spotlight on Optics

You Sin Tan1, Hao Wang1,3、*, Hongtao Wang1, Chengfeng Pan1, and Joel K. W. Yang1,2,4、*
Author Affiliations
  • 1Singapore University of Technology and Design, 487372 Singapore, Singapore
  • 2Institute of Materials Research and Engineering, A*STAR (Agency for Science, Technology and Research), 138634 Singapore, Singapore
  • 3e-mail: hao_wang@sutd.edu.sg
  • 4e-mail: joel_yang@sutd.edu.sg
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    References(70)

    [24] A. Nadzeyka, S. Bauerdick, M. Kahl, H. Duan, Y. Chen, K. Bi. FIB-based sketch & peel for fast and precise patterning of large-scale nanostructures. Conference on Electron, Ion and Photon Beam Technology and Nanofabrication (EIPBN), 4(2018).

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    You Sin Tan, Hao Wang, Hongtao Wang, Chengfeng Pan, Joel K. W. Yang. High-throughput fabrication of large-scale metasurfaces using electron-beam lithography with SU-8 gratings for multilevel security printing[J]. Photonics Research, 2023, 11(3): B103

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    Paper Information

    Special Issue: OPTICAL METASURFACES: FUNDAMENTALS AND APPLICATIONS

    Received: Aug. 8, 2022

    Accepted: Nov. 9, 2022

    Published Online: Feb. 24, 2023

    The Author Email: Hao Wang (hao_wang@sutd.edu.sg), Joel K. W. Yang (joel_yang@sutd.edu.sg)

    DOI:10.1364/PRJ.472212

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