Acta Optica Sinica, Volume. 43, Issue 1, 0112001(2023)
Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask
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Wei Cheng, Sikun Li, Xiangzhao Wang. Method for Inspection of Phase Defects in Extreme Ultraviolet Lithography Mask[J]. Acta Optica Sinica, 2023, 43(1): 0112001
Category: Instrumentation, Measurement and Metrology
Received: May. 27, 2022
Accepted: Jun. 20, 2022
Published Online: Jan. 6, 2023
The Author Email: Li Sikun (lisikun@siom.ac.cn), Wang Xiangzhao (wxz26267@siom.ac.cn)