[1] G E JELLISON. The calculation of thin film parameters from the spectroscopic ellipsometry data. Thin Solid Films, 290, 40-45(1996).

[2] D ROY. Optical characterization of multilayer thin films using the surface plasmon Resonance method: a six phase model based on the krestchmann formalism. Optics Communications, 200, 119-130(2001).

[3] R M AZZA. Stokes-vector and Mueller-matrix polarimetry. Journal of the Optical Society of America A, 33, 1396-1408(2016).

[4] D E ASPNES. Spectroscopic ellipsometry—Past, present, and future. Thin Solid Films, 571, 334-344(2014).

[5] M FRIED. On-line monitoring of solar cell module production by ellipsometry technique. Thin Solid Films, 571, 345-355(2014).

[6] P KOIRALA, D ATTYGALLE, P ARYTAL. Real time spectroscopic ellipsometry for analysis and control of thin film polycrystalline semiconductor deposition in photovoltaics. Thin Solid Films, 571, 442-446(2014).

[7] Shiyuan LIU. Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology. Thin Solid Films, 584, 176-185(2015).

[8] B BOULESTEIX, A MARTINO. Mueller polarimetric imaging system with liquid crystals. Applied Optics, 43, 2824-2832(2004).

[9] S ALALI, A GRIBBLE. Rapid wide-field Mueller matrix polarimetry imaging based on four photoelastic modulators with no moving parts. Optics Letters, 41, 1038-1040(2016).

[10] N HAGEN, E L DERENIAK. Snapshot Mueller matrix spectropolarimetry. Optics Letters, 32, 2100-2102(2007).

[11] M DUBREUIL, J CARIOU. Snapshot Mueller matrix polarimeter by wavelength polarization coding. Optics Express, 15, 13660-13668(2007).

[12] Naicheng QUAN, Chunmin ZHANG. Spectroscopic Mueller matrix polarimeter based on spectro-temporal modulation. Optics Express, 28, 37758-37772(2020).