Journal of Semiconductors, Volume. 43, Issue 12, 122101(2022)

Interfacial dynamics of GaP/Si(100) heterostructure grown by molecular beam epitaxy

Tieshi Wei1,2, Xuefei Li1、*, Zhiyun Li3, Wenxian Yang1, Yuanyuan Wu1, Zhiwei Xing1, and Shulong Lu1、**
Author Affiliations
  • 1Key Laboratory of Nanodevices and Applications, Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
  • 2Nano Science and Technology Institute, University of Science and Technology of China, Suzhou 215123, China
  • 3Vacuum Interconnected Nanotech Workstation (NANO-X), Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
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    References(32)

    [18] [18] D. Keith Bowen and Tanner. B K, High resolution X-ray diffractometry and topography. Abingdon, Taylor & Francis e-Library, 1998

    [21] [21] Brenner M R. GaP/Si heteroepitaxy (suppression of nucleation related defects). Ohio, The Ohio State University, 2009

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    Tieshi Wei, Xuefei Li, Zhiyun Li, Wenxian Yang, Yuanyuan Wu, Zhiwei Xing, Shulong Lu. Interfacial dynamics of GaP/Si(100) heterostructure grown by molecular beam epitaxy[J]. Journal of Semiconductors, 2022, 43(12): 122101

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    Paper Information

    Category: Articles

    Received: Jun. 12, 2022

    Accepted: --

    Published Online: Dec. 27, 2022

    The Author Email: Li Xuefei (xfli2011@sinano.ac.cn), Lu Shulong (sllu2008@sinano.ac.cn)

    DOI:10.1088/1674-4926/43/12/122101

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