Distortion Detect of Large Field Projection Lithography Lens

Acta Photonica Sinica, Volume. 34, Issue 1, 46(2005)

[in Chinese] and [in Chinese]

Author Affiliations

[in Chinese]

show less

References(4)

[1] [1] Cote D, Ahouse D, Galburt D,et al. Advances in 193 nm lithography tools.Proc SPIE,2000,4000: 542～550

[2] [2] Wong A K.Microlithography:Trends,Challenges,Solutions,and Their Impact on Design.IEEE Micro,2003,23(2):12～21

[3] [3] Wagner C, Kaiser W,Mulkens J,et al.Advanced technology for extending optical lithography.Proc SPIE,2000,4000: 344～357

[4] [4] Harriott L R.Limits of lithography.Proc IEEE,2001,89(3):366～374

CLP Journals

Tools

Get Citation

Copy Citation Text

[in Chinese], [in Chinese]. Distortion Detect of Large Field Projection Lithography Lens[J]. Acta Photonica Sinica, 2005, 34(1): 46

Download Citation

Paper Information

Category:

Received: Oct. 29, 2003

Accepted: --

Published Online: Jun. 12, 2006

The Author Email:

DOI:

Topics