Acta Photonica Sinica, Volume. 34, Issue 1, 46(2005)

Distortion Detect of Large Field Projection Lithography Lens

[in Chinese] and [in Chinese]
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    References(4)

    [1] [1] Cote D, Ahouse D, Galburt D,et al. Advances in 193 nm lithography tools.Proc SPIE,2000,4000: 542~550

    [2] [2] Wong A K.Microlithography:Trends,Challenges,Solutions,and Their Impact on Design.IEEE Micro,2003,23(2):12~21

    [3] [3] Wagner C, Kaiser W,Mulkens J,et al.Advanced technology for extending optical lithography.Proc SPIE,2000,4000: 344~357

    [4] [4] Harriott L R.Limits of lithography.Proc IEEE,2001,89(3):366~374

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    [in Chinese], [in Chinese]. Distortion Detect of Large Field Projection Lithography Lens[J]. Acta Photonica Sinica, 2005, 34(1): 46

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    Paper Information

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    Received: Oct. 29, 2003

    Accepted: --

    Published Online: Jun. 12, 2006

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