Spectroscopy and Spectral Analysis, Volume. 33, Issue 2, 535(2013)

Research on the Atomic Emission Spectroscopy of Atmospheric Pressure Plasma Process

JIN Jiang1,*... LI Na1, XU Lu2, WANG Bo1 and JIN Hui-liang1 |Show fewer author(s)
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  • 1[in Chinese]
  • 2[in Chinese]
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    References(5)

    [1] [1] Andreas Schutze, James Y Jeong, Steven E Babayan, et al. IEEE Transactions on Plasma Science, 1998, 26(6): 1685.

    [6] [6] Rami Ben Gadria, Roth J Reece, Thomas C Montie, et al. Surface and Coatings Technology, 2000, 131: 528.

    [7] [7] William John O’Brien. The Characterisation and Material Removal Properties of the Reactive Atom Plasma (RAPTM) Process. PhD Thesis of Cranfield University, 2010. 154.

    [8] [8] Yamamura K, Shimada S, Mori Y. CIRP Annals-Manufacturing Technology, 2008, 57: 567.

    [10] [10] Baldur Eliasson, Ulrich Kogelschatz. IEEE Transactions on Plasma Science, 1991, 19(6): 1063.

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    JIN Jiang, LI Na, XU Lu, WANG Bo, JIN Hui-liang. Research on the Atomic Emission Spectroscopy of Atmospheric Pressure Plasma Process[J]. Spectroscopy and Spectral Analysis, 2013, 33(2): 535

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    Paper Information

    Received: Mar. 16, 2012

    Accepted: --

    Published Online: Mar. 27, 2013

    The Author Email: Jiang JIN (jj041616@126.com)

    DOI:10.3964/j.issn.1000-0593(2013)02-0535-05

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