[1] [1] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.

[2] [2] Han S U, Eun H C, Lim Y. Appl. Phys. Letters, 2002, 80(5): 737.

[3] [3] Gherarid N, Martin S, Massines F. J. Phys. D: Appl. Phys., 2000, 33(19): L104.

[4] [4] Stefanovic I, Bibinov N K, Deryugin A A, et al. Plasma Sources Sci. Technol., 2001, 10(3): 406.

[5] [5] Laroussi M, Alexeff I, Kang W L. IEEE Trams. Plasma Sci., 2000, 28(1): 184.

[6] [6] Zhang H Y, Wang D Z, Wang X G. Chin. Phys., 2007, 16(4): 1089.

[7] [7] Li X C, Zhao N, Fang T Z, et al. Plasma Sources Sci. Technol., 2008, 17: 015017.

[8] [8] Ono R, Oda T. J. Appl. Phys., 2003, 93(10): 5876.

[9] [9] Li S Z, Huang W T, Zhang J L, et al. Appl. Phys. Lett., 2009, 94: L1. 1501.