Acta Optica Sinica, Volume. 41, Issue 9, 0911004(2021)
Local Level Set Based Mask Optimization with Semi-Implicit Discretization
This paper proposes to apply a semi-implicit difference scheme where diffusion terms in the time-dependent partial differential equation are discretized implicitly and non-diffusion ones explicitly thus overcoming the prohibitive step-size in lithographic mask optimization (MO). Further, monitoring pixels on mask pattern contour instead of all pattern pixels are selected locally corresponding to high-frequency layout component and optimized to ease the computation complexity. Superior MO performance is demonstrated by the simulation results in terms of improved convergence with reduced optimization dimensionality.
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Yijiang Shen, Xiaopeng Wang, Yanzhou Zhou, Zhenrong Zhang. Local Level Set Based Mask Optimization with Semi-Implicit Discretization[J]. Acta Optica Sinica, 2021, 41(9): 0911004
Category: Imaging Systems
Received: Jul. 22, 2020
Accepted: Dec. 2, 2020
Published Online: May. 8, 2021
The Author Email: Shen Yijiang (yjshen@gdut.edu.cn)