Acta Photonica Sinica, Volume. 33, Issue 4, 509(2004)

[in Chinese]

[in Chinese] and [in Chinese]
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  • [in Chinese]
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    References(4)

    [1] [1] Blanca C M, Hell S W, Planck M.Axial superresolution with ultrahigh aperture lenses.Optik,2002,10(8):893~898

    [2] [2] Pfeiffer H C. Projection reduction exposure variable axis immersion lenses:next generation lithography.Vac Sci Technology,1999,B17(11/12):2566~2576

    [3] [3] Dewolf P,Brazel E.Electrical testing application for scanning probe microscopes.Solid State Technology,2000,38(9):117~125

    [4] [4] Liu Z, Ximen J J. An analytical study of first-and third-order chromatic aberrations for hutter′s electrostatic immersion lenses.Optik,1999,10(11):463~470

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    Paper Information

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    Received: May. 27, 2003

    Accepted: --

    Published Online: Oct. 25, 2006

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