Acta Physica Sinica, Volume. 69, Issue 15, 157801-1(2020)
Figures & Tables(13)
Fig. 1. Flow chart of preparation of single crystal lithium niobate films by direct bonding of wafers.
Fig. 2. Flow chart of fabricating LN microdisk using femtosecond laser micromachining: (a) Depositing metallic chromium on LN sample surface; (b) transferring microdisk graphics onto chrome layer by femtosecond laser micromachining; (c) transferring microdisk pattern onto LN film by CMP; (d) wet etching removes chromium film and SiO2[20].
Fig. 3. Preparation process of PPLN ridge waveguide: (a) The
Fig. 4. (a) A SEM coloring image of polished micro-ring resonator (LN is yellow; SiO2 is gray); (b)−(d) influences of different polishing parameters on the final sidewall roughness[37].
Fig. 5. Schematic of using CMP technology to prepare LNOI on-chip optics: (a) Depositing Cr film on LNOI by magnetron sputtering; (b) femtosecond laser processing defines the pattern to be processed; (c) CMP process to remove excess LN; (d) use Cr etchant to remove the etching mask and secondary CMP process; (e) schematic diagram of CMP instrument[38].
Fig. 6. (a), (b) SEM images of the LNOI modulator; (c) enlarged view of the coupling area of the track modulator; (d) enlarged view of the electrode and optical waveguide; (e) transmission spectrum of MZI modulator; (f) electro-optical bandwidth of racetrack modulator (9 V, 1480−1580 nm)[47].
Fig. 7. False-colored SEM image of LNOI plasma electro-optic directional coupler[51].
Fig. 8. (a) Spectrum of the cascade process: the pump wavelength is fixed at 1534.9 nm, and the signal wavelength is at 1541.8 and 1548.9 nm. (b) Effective FWM process in LN microdisk, FW idler power dependence and theoretical fitting, the signal power is maintained at 5 mW[55].
Fig. 9. (a) Photograph of the LN microring resonator, the black line is an etched optical waveguide, and the yellow area is a gold electrode. (b) The output spectrum of the EO frequency comb generated from the micro-ring resonator. The left illustration shows an enlarged view of several comb teeth. The power variation between the comb teeth is about 0.1 dB. The right inset shows the transmission spectra of several different modulation indices (
Fig. 10. (a), (b) Generation of a broadband frequency comb: The frequency comb spectrum is generated when the pump power is 300 mW and the input signal resonates with the (a) TM mode and the (b) TE mode; (c) SEM image of nanophotonic circuit on LN film[65].
Fig. 11. (a) Micrograph of M-Z interferometer type and (b) resonator type acousto-optic modulator; (c) SEM image of the optical waveguide; (d) SEM image of the IDT region[68].
Table 1.
Main performance parameters of LN on-chip photonic devices fabricated by different fabrication techniques.
不同加工手段制备的LN片上光子学器件的主要性能参数
View tableView in ArticleTable 1.
Main performance parameters of LN on-chip photonic devices fabricated by different fabrication techniques.
不同加工手段制备的LN片上光子学器件的主要性能参数
加工图案 微纳加工技术 尺寸 损耗(测量波长) 品质因子(测量波长/nm) 微盘[ 13 ]紫外光刻技术 d = 50 μm — 1.5 × 106 (1551.4) 微盘[ 12 ]r = 50 μm — 3.1 × 105 (1550) 微盘[ 40 ]电子束曝光技术 r = 25 μm — 2.9 × 105 (1502) 微盘[ 41 ]r = 25 μm — 2.69 × 105 (1548.78) 微环[ 1 ]r = 100 μm — 1.1 × 107 (637) 微环[ 42 ]r = 80 μm — ～107 (1590) 光子晶体微腔[ 14 ]w = 750 nm — 1.09 × 105 (1452) h = 250 nm a = 600 nm 微盘[ 21 ]飞秒激光微加工 d = 29.92 μm — 9.61 × 106 (1547.8) 微盘[ 20 ]d = 140 μm — 1.46 × 107 (773.49) 双微盘[ 43 ]d = 29.92 μm — 1.35 × 105 (1528.5) g = 138 nm 脊形波导[ 1 ]电子束曝光技术 W = 480 nm 6 dB/m (635 nm) — H = 120 nm 脊形波导[ 42 ]W = 2.4 μm (2.7 ± 0.3) dB/m (1590 nm) — H = 0.25 μm 脊形波导[ 29 ]异质集成 W = 1.3 μm 0.1 dB/m (1550 nm) — H = 0.5 μm 脊形波导[ 37 ]化学机械抛光 W = 4 μm 4 dB/m (1550 nm) — H = 3 μm
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Geng-Lin Li, Yue-Chen Jia, Feng Chen.
Paper Information
Received: Feb. 27, 2020
Accepted: --
Published Online: Dec. 30, 2020
The Author Email: Chen Feng (drfchen@sdu.edu.cn)
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