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Journal of Applied Optics, Volume. 40, Issue 1, 93(2019)

Analysis on influence of slit setting in monochromator wavelength calibration

GAO Fang1...2, ZHAI Wenchao1, LI Jianjun1 and XIE Chenyu1 |Show fewer author(s)
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  • 2[in Chinese]
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    GAO Fang, ZHAI Wenchao, LI Jianjun, XIE Chenyu. Analysis on influence of slit setting in monochromator wavelength calibration[J]. Journal of Applied Optics, 2019, 40(1): 93

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    Received: Aug. 17, 2018

    Accepted: --

    Published Online: Apr. 2, 2019

    The Author Email:

    DOI:10.5768/jao201940.0103003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology