A new type nanometer Coordinate Measuring Machine(CMM) stage which meets the Abbe principle in three-dimensional directions is proposed to avoid the Abbe error in conventional CMMs and reduce the guide motion error that influences on the nano-CMM measurement uncertainty. The stage can move in three dimensional directions and its x guide and y guide are in a coplanar structure. The three measuring lines of the stage are orthogonal and intersect at one point which coincides with the center of a probe. Moreover, the measuring lines of x measurement system and y measurement system are coplanar with the plane of the xy stage. According to the characteristics of this stage, the impacts of various errors on the stage are analyzed, the main source errors to the measurement uncertainty are given and new correction methods for those errors are proposed. Finally, two pieces of first gauge block are measured on the developed stage. Measurement results show that the standard deviation of flatness error of first gauge block working surface is 11 nm, and that of step height is about 21 nm and the difference between the average of step heights and the calibrated value is about 1 nm. The theoretical analysis and experiment show that the nano-CMM avoids the impact of various error sources, especially the impact of Abbe error, and can be used in high-precision three-dimensional measurement.