Opto-Electronic Engineering, Volume. 33, Issue 1, 6(2006)

Improvement on the radiometric temperature measurement in small laser-processing region

[in Chinese]... [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese] and [in Chinese] |Show fewer author(s)
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    References(4)

    [3] [3] STRITZKER B,POSPIESZCZYK A,TAGLE J.A.Measurement of lattice temperature of silicon during pulsed laser annealing[J].Physical Review Letters,1981,47(5):356-358.

    [4] [4] GUIDOTTI Daniel,WILMAN John G.Novel and nonintrusive optical thermometer[J].Appl.Phys.Lett,1992,60(5):524-526.

    [5] [5] ZHOU Y.H,ZHANG Z.M,D.P.DeWITT,et al.Effects of radiative properties of surfaces on radiometric temperature measurement[A].9th int.Conference on Advanced Thermal Processing of Semiconductors-RTP'[C].Hilton Anchorage,Alaska:IEEE,2001.179-188.

    [11] [11] RYU Zee M.Measurement of point spread function of thermal imager[J].SPIE,1991,1467:469-474.

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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Improvement on the radiometric temperature measurement in small laser-processing region[J]. Opto-Electronic Engineering, 2006, 33(1): 6

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    Received: May. 13, 2005

    Accepted: --

    Published Online: Nov. 14, 2007

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