Laser & Optoelectronics Progress, Volume. 59, Issue 9, 0922011(2022)

Research Progress on Illumination System Technology of Step-and-Scan Projection Lithography Tools

Jiahong Liu1,2, Fang Zhang1、*, and Huijie Huang1,2、**
Author Affiliations
  • 1Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049
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    Figures & Tables(10)
    Schematic of illumination system of step-and-scan lithography tools
    Diagram of illumination mode development state[19]
    Schematic of different illumination modes by zoom Fourier transform lens group and axicon lens group[21]
    Schematic of pupil shaping based on micro-mirror array[25]
    Schematic of pupil compensation technology. (a) Schematic of filter[26]; (b) schematic of compensating finger[27]
    Schematic of intensity distribution of top-Gaussian illumination optical field[29]
    Schematic of homogenizing principle of integrator rod
    Schematic of working principle of illumination homogenization unit with MLAs[32]
    Schematic of finger array uniformity corrector[39]
    Schematic of generally used polarized illumination modes under traditional illumination mode[41]
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    Jiahong Liu, Fang Zhang, Huijie Huang. Research Progress on Illumination System Technology of Step-and-Scan Projection Lithography Tools[J]. Laser & Optoelectronics Progress, 2022, 59(9): 0922011

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 8, 2022

    Accepted: Apr. 2, 2022

    Published Online: May. 10, 2022

    The Author Email: Zhang Fang (zhangfang@siom.ac.cn), Huang Huijie (huanghuijie@siom.ac.cn)

    DOI:10.3788/LOP202259.0922011

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