[1] [1] Xu Weicai. Optical Design and Imaging Performance Compensation for the Lithographic Lens [D]. Changchun: Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, 2011. 29-31.

[2] [2] Dai Yifan, Zhou Lin, Xie Xuhui, et al.. Deterministic figuring in optical machining by ion beam [J]. Acta Optica Sinica, 2008, 28(6): 1131-1135.

[3] [3] Tomoyuki Matsuyama, Issey Tanaka, Toshihiko Ozawa, et al.. Improving lens performance through the most recent lens manufacturing process [C]. SPIE, 2003, 5040: 801-810.

[4] [4] Toshiyuki Yoshihara, Ryo Koizumi, Kazuhiro Takahashi, et al.. Realization of very-small aberration projection lenses [C]. SPIE, 2000, 4000: 559-566.

[5] [5] Miao Erlong, Zhang Jian, Gu Yongqiang, et al.. Measurement error analysis of high precision Fizeau interferometer for lithography projection objective [J]. Chinese J Lasers, 2010, 37(8): 2029-2034.

[6] [6] Wang Ping, Tian Wei, Wang Rudong, et al.. Rotating chuck test for removing chuck error of optical surface [J]. Acta Optica Sinica, 2011, 31(8): 0812004.

[7] [7] Peter Hartmann, Reiner Mackh, Heiko Kohlmann. Advances in the homogeneity measurement of optical glasses at the Schott 20 inch Fizeau interferometer [C]. SPIE, 1996, 2775: 108-114.

[8] [8] Wei Xueye, Yu Xin. An optical wavefront sening and reconstruction method based on Zernike polynominals [J]. Acta Optica Sinica, 1994, 14(7): 718-723.

[9] [9] Shouhong Tang, Richard E Bills, Klaus Freischlad, et al.. High accuracy measurements of objects with multiple reflective surfaces with wavelength shifting interferometry [C]. SPIE, 2007, 6723: 67230F.

[10] [10] Leslie L Deck. Multiple surface phase shifting interferometry [C]. SPIE, 2001, 4451: 424-431.