Infrared and Laser Engineering, Volume. 46, Issue 11, 1118003(2017)

Application of aspheric technique in immersion lithography lighting system

Li Meixuan1,2、*, Wang Li1, Dong Lianhe1, and Zhao Ying2
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    Li Meixuan, Wang Li, Dong Lianhe, Zhao Ying. Application of aspheric technique in immersion lithography lighting system[J]. Infrared and Laser Engineering, 2017, 46(11): 1118003

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    Paper Information

    Category: 光学设计及仿真

    Received: Mar. 5, 2017

    Accepted: Apr. 3, 2017

    Published Online: Dec. 26, 2017

    The Author Email: Meixuan Li (limeixuannuc@163.com)

    DOI:10.3788/irla201746.1118003

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