Acta Optica Sinica, Volume. 39, Issue 1, 0122001(2019)
Effect of Thermal Deformation on Imaging Performance for 16 nm Extreme Ultraviolet Lithography Objective
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Yanqiu Li, Yan Liu, Lihui Liu. Effect of Thermal Deformation on Imaging Performance for 16 nm Extreme Ultraviolet Lithography Objective[J]. Acta Optica Sinica, 2019, 39(1): 0122001
Category: Optical Design and Fabrication
Received: Jul. 11, 2018
Accepted: Sep. 5, 2018
Published Online: May. 10, 2019
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